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p-type Zn1-xMgxO Films with Sb Doping by Radio-Frequency Magnetron Sputtering | |
Wang P; Chen NF(陈诺夫); Yin ZG; Dai RX; Bai YM; Wang, P (reprint author), Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, POB 912, Beijing 100083, Peoples R China. | |
Source Publication | Applied Physics Letters |
2006 | |
Volume | 89Issue:20Pages:Art.No.202102 |
ISSN | 0003-6951 |
Abstract | Sb-doped Zn1-xMgxO films were grown on c-plane sapphire ubstrates by radio-frequency magnetron sputtering. The p-type conduction of the films (0.05 <= x <= 0.13) was confirmed by Hall measurements, revealing a hole concentration of 10(15)-10(16) cm(-3) and a mobility of 0.6-4.5 cm(2)/V s. A p-n homojunction comprising an undoped ZnO layer and an Sb-doped Zn0.95Mg0.05O layer shows a typical rectifying characteristic. Sb-doped p-type Zn1-xMgxO films also exhibit a changeable wider band gap as a function of x, implying that they can probably be used for fabrication of ZnO-based quantum wells and ultraviolet optoelectronic devices. (c) 2006 American Institute of Physics. |
Subject Area | 力学 |
DOI | 10.1063/1.2388254 |
Indexed By | SCI ; EI |
Language | 英语 |
WOS ID | WOS:000242100200036 |
WOS Keyword | ZNO THIN-FILMS ; MGXZN1-XO ; DEVICES ; ALLOY |
WOS Research Area | Physics |
WOS Subject | Physics, Applied |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://dspace.imech.ac.cn/handle/311007/15399 |
Collection | 力学所知识产出(1956-2008) |
Corresponding Author | Wang, P (reprint author), Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, POB 912, Beijing 100083, Peoples R China. |
Recommended Citation GB/T 7714 | Wang P,Chen NF,Yin ZG,et al. p-type Zn1-xMgxO Films with Sb Doping by Radio-Frequency Magnetron Sputtering[J]. Applied Physics Letters,2006,89,20,:Art.No.202102. |
APA | Wang P,陈诺夫,Yin ZG,Dai RX,Bai YM,&Wang, P .(2006).p-type Zn1-xMgxO Films with Sb Doping by Radio-Frequency Magnetron Sputtering.Applied Physics Letters,89(20),Art.No.202102. |
MLA | Wang P,et al."p-type Zn1-xMgxO Films with Sb Doping by Radio-Frequency Magnetron Sputtering".Applied Physics Letters 89.20(2006):Art.No.202102. |
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