磁过滤对多弧离子镀(TiAl)N薄膜的影响

IMECH-IR > 力学所知识产出(1956-2008)

	磁过滤对多弧离子镀(TiAl)N薄膜的影响
	李成明; 张勇; 曹尔妍; 薛明伦
Source Publication	中国有色金属学报
	2001
Volume	11 Issue:S1 Pages:179-182
ISSN	1004-0609
Abstract	介绍了利用过滤电弧离子镀沉积(TiAl) N 薄膜初步的研究结果。在电弧靶材前沿的磁场作用下, 有效减小了薄膜的宏观颗粒尺寸, 并极大地降低了颗粒密度。同时, 过滤电弧的作用, 使偏压对膜成分的影响减弱, 薄膜的硬度随膜中铝含量的增加而提高, (TiAl) N 的抗氧化能力明显提高。
Subject Area	力学
Indexed By	其他
Document Type	期刊论文
Identifier	http://dspace.imech.ac.cn/handle/311007/15758
Collection	力学所知识产出(1956-2008)
Recommended Citation GB/T 7714	李成明,张勇,曹尔妍,等. 磁过滤对多弧离子镀(TiAl)N薄膜的影响[J]. 中国有色金属学报,2001,11,S1,:179-182.
APA	李成明,张勇,曹尔妍,&薛明伦.(2001).磁过滤对多弧离子镀(TiAl)N薄膜的影响.中国有色金属学报,11(S1),179-182.
MLA	李成明,et al."磁过滤对多弧离子镀(TiAl)N薄膜的影响".中国有色金属学报 11.S1(2001):179-182.

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