Diffusion mechanisms in the Fe3ASi

IMECH-IR > 力学所知识产出(1956-2008)

	Diffusion mechanisms in the Fe3ASi
	Chen YC(陈永冲); Zhang YG(张永刚); Wei BC(魏炳忱)
Source Publication	原子与分子物理学报
	2003
Volume	20 Issue:2 Pages:143-148
ISSN	1000-0364
Abstract	In this paper, the possible reasons for the high thermal vacancy concentration and the low migration barriers for the Fe atom diffusion in the DO3 structure Fe3Si have been discussed.
Subject Area	力学
Indexed By	国内刊物
Document Type	期刊论文
Identifier	http://dspace.imech.ac.cn/handle/311007/16219
Collection	力学所知识产出(1956-2008)
Recommended Citation GB/T 7714	Chen YC,Zhang YG,Wei BC. Diffusion mechanisms in the Fe3ASi[J]. 原子与分子物理学报,2003,20,2,:143-148.
APA	陈永冲,张永刚,&魏炳忱.(2003).Diffusion mechanisms in the Fe3ASi.原子与分子物理学报,20(2),143-148.
MLA	陈永冲,et al."Diffusion mechanisms in the Fe3ASi".原子与分子物理学报 20.2(2003):143-148.

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