| Effects of superimposed pulse bias on TiN coating in cathodic arc deposition |
| Li ZY(李正阳) ; Zhu WB(朱武飚); Zhang Y(张勇) ; Li GY(李桂英) ; Cao EY(曹尔妍) ; Li, ZY (reprint author), Chinese Acad Sci, Inst Mech, Beijing 100080, Peoples R China.
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Source Publication | Surface & Coatings Technology
(IF:3.192[JCR-2018],3.11[5-Year]) |
| 2000
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Volume | 131Issue:1-3Pages:158-161 |
ISSN | 0257-8972
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Abstract | Orthogonal designs are used to investigate the main factors when doing experiments in which pulse bias is superimposed on d.c. bias during cathodic are deposition of TiN. Pulse peak, duty cycle, frequency, direct voltage, are current and pressure all are investigated when coating TiN on HSS substrates. Roughness, surface micrograph, microhardness and thickness are tested. By analysis of variance, it is shown that pressure and frequency are the main factors. R-a and droplet density of the film with (d.c. + pulse) bias decrease. A simple explanation for the result is suggested. |
Subject Area | 力学
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Indexed By | SCI
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Language | 英语
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WOS ID | WOS:000165548200032
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WOS Research Area | Materials Science
; Physics
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WOS Subject | Materials Science, Coatings & Films
; Physics, Applied
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Citation statistics |
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Document Type | 期刊论文
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Identifier | http://dspace.imech.ac.cn/handle/311007/16804
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Collection | 力学所知识产出(1956-2008)
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Corresponding Author | Li, ZY (reprint author), Chinese Acad Sci, Inst Mech, Beijing 100080, Peoples R China. |
Recommended Citation GB/T 7714 |
Li ZY,Zhu WB,Zhang Y,et al. Effects of superimposed pulse bias on TiN coating in cathodic arc deposition[J]. Surface & Coatings Technology,2000,131,1-3,:158-161.
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APA |
李正阳,朱武飚,张勇,李桂英,曹尔妍,&Li, ZY .(2000).Effects of superimposed pulse bias on TiN coating in cathodic arc deposition.Surface & Coatings Technology,131(1-3),158-161.
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MLA |
李正阳,et al."Effects of superimposed pulse bias on TiN coating in cathodic arc deposition".Surface & Coatings Technology 131.1-3(2000):158-161.
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