我国等离子体工艺研究进展

IMECH-IR > 力学所知识产出(1956-2008)

	我国等离子体工艺研究进展
	吴承康
Source Publication	物理
	1999
Volume	28 Issue:7 Pages:388
ISSN	0379-4148
Abstract	扼要综述了我国等离子体材料工艺研究的新近进展。内容包括：热等离子体源，等离子冶金、化工、超细粉合成、喷涂；低气压非平衡等离子体源，镀膜，表面改性，等离子浸没离子注入；电晕放电，介质阻挡放电，滑动弧等及其应用。当前，各类薄膜制备和表面改性的研究工作最为活跃。
Keyword	等离子体工艺热等离子体非平衡等离子体
Subject Area	力学
Indexed By	CSCD
Language	中文
CSCD ID	CSCD:783454
Citation statistics	Cited Times:7[CSCD] [CSCD Record]
Document Type	期刊论文
Identifier	http://dspace.imech.ac.cn/handle/311007/17078
Collection	力学所知识产出(1956-2008)
Recommended Citation GB/T 7714	吴承康. 我国等离子体工艺研究进展[J]. 物理,1999,28,7,:388.
APA	吴承康.(1999).我国等离子体工艺研究进展.物理,28(7),388.
MLA	吴承康."我国等离子体工艺研究进展".物理 28.7(1999):388.

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