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The induction plasma chemical reactor: Part II. Kinetic model | |
Zhao GY; Mostaghimi J; Boulos MI | |
Source Publication | Plasma Chemistry and Plasma Processing
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1990 | |
Volume | 10Issue:1Pages:151-166 |
ISSN | 0272-4324 |
Abstract | A kinetic model has been developed for the prediction of the concentration gelds in an rf plasma reactor. A sample calculation for a SiCl4/H2 system is then performed. The model considers the mixing processes along with the kinetics of seven reactions involving the decomposition of these reactants. The results obtained are compared to those assuming chemical equilibrium. The predictions indicate that an equilibrium assumption will result in lower predicted temperature fields in the reactor. Furthermore, for the chemical system considered here, while differences exist between the concentration fields obtained by the two models, the differences are not substantial. |
Keyword | Induction Plasma - Modeling - Chemical Kinetics - Dissociation Of Silicon Tetrachloride |
DOI | 10.1007/BF01460453 |
Indexed By | SCI |
Language | 英语 |
WOS ID | WOS:A1990CT88500009 |
WOS Research Area | Engineering ; Physics |
WOS Subject | Engineering, Chemical ; Physics, Applied ; Physics, Fluids & Plasmas |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://dspace.imech.ac.cn/handle/311007/39596 |
Collection | 力学所知识产出(1956-2008) |
Recommended Citation GB/T 7714 | Zhao GY,Mostaghimi J,Boulos MI. The induction plasma chemical reactor: Part II. Kinetic model[J]. Plasma Chemistry and Plasma Processing,1990,10,1,:151-166. |
APA | Zhao GY,Mostaghimi J,&Boulos MI.(1990).The induction plasma chemical reactor: Part II. Kinetic model.Plasma Chemistry and Plasma Processing,10(1),151-166. |
MLA | Zhao GY,et al."The induction plasma chemical reactor: Part II. Kinetic model".Plasma Chemistry and Plasma Processing 10.1(1990):151-166. |
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