Knowledge Management System of Institue of Mechanics, CAS
Fast plasma sintering deposition of nano-structured silicon carbide coatings | |
Huang HJ(黄河激); Fu ZQ(付志强); Pan WX(潘文霞); Wu CK(吴承康); Huang HJ(黄河激) | |
Source Publication | 18th International Vacuum Congress.北京.2010-08-23~2010-08-27. |
2011-01-06 | |
Conference Name | 18th International Vacuum Congress |
Conference Date | 2010-08-23~2010-08-27 |
Conference Place | 北京 |
Abstract | Fast plasma sintering deposition of SiC nano-structured coatings was achieved using a specially designed non-transferred dc plasma torch operated at reduced pressure. Employing the Taguchi method, the deposition parameters were optimized and verified. With the optimized combination of deposition parameters, homogeneous SiC coatings were deposited on relatively large area substrates of Φ50 mm and 50×50 mm with a deposition rate as high as 20 μm/min. Ablation test showed that such coatings can be used as oxidation resistance coatings in high temperature oxidizing environment. |
Keyword | Reduced-pressure Plasma Sintering Deposition Silicon Carbide Coating Ultrafast Deposition |
Department | LHD应用等离子体力学(CPCR) |
Indexed By | CPCI |
Language | 英语 |
Document Type | 会议论文 |
Identifier | http://dspace.imech.ac.cn/handle/311007/43279 |
Collection | 等离子体与燃烧中心(2009-2011) |
Corresponding Author | Huang HJ(黄河激) |
Recommended Citation GB/T 7714 | Huang HJ,Fu ZQ,Pan WX,et al. Fast plasma sintering deposition of nano-structured silicon carbide coatings[C]18th International Vacuum Congress.北京.2010-08-23~2010-08-27.,2011. |
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IVC18-huang-full-03.(7190KB) | 会议论文 | 开放获取 | CC BY-NC-SA | View Download |
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