IMECH-IR  > 等离子体与燃烧中心(2009-2011)
Fast plasma sintering deposition of nano-structured silicon carbide coatings
Huang HJ(黄河激); Fu ZQ(付志强); Pan WX(潘文霞); Wu CK(吴承康); Huang HJ(黄河激)
Source Publication18th International Vacuum Congress.北京.2010-08-23~2010-08-27.
2011-01-06
Conference Name18th International Vacuum Congress
Conference Date2010-08-23~2010-08-27
Conference Place北京
AbstractFast plasma sintering deposition of SiC nano-structured coatings was achieved using a specially designed non-transferred dc plasma torch operated at reduced pressure. Employing the Taguchi method, the deposition parameters were optimized and verified. With the optimized combination of deposition parameters, homogeneous SiC coatings were deposited on relatively large area substrates of Φ50 mm and 50×50 mm with a deposition rate as high as 20 μm/min. Ablation test showed that such coatings can be used as oxidation resistance coatings in high temperature oxidizing environment.
KeywordReduced-pressure Plasma Sintering Deposition Silicon Carbide Coating Ultrafast Deposition
DepartmentLHD应用等离子体力学(CPCR)
Indexed ByCPCI
Language英语
Document Type会议论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/43279
Collection等离子体与燃烧中心(2009-2011)
Corresponding AuthorHuang HJ(黄河激)
Recommended Citation
GB/T 7714
Huang HJ,Fu ZQ,Pan WX,et al. Fast plasma sintering deposition of nano-structured silicon carbide coatings[C]18th International Vacuum Congress.北京.2010-08-23~2010-08-27.,2011.
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