| Effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 and stress control | |
Li YQ(李玉琼) ; Wang HQ; Wang WY; Yu ZN; Liu HS(刘河山); Jin G(靳刚); Jin, G
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| Source Publication | ACTA MECHANICA SINICA
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| 2012-10-01 | |
| Volume | 28Issue:5Pages:1382-1388 |
| ISSN | 0567-7718 |
| Abstract | Based on Hartmann-Shack sensor technique, an online thin film stress measuring system was introduced to measure the film stresses of TiO2 and SiO2, and comparison was made between the film stresses prepared respectively by the conventional process and the ion-beam assisted deposition. The effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 was investigated in details, and the stress control methodologies using on-line adjustment and film doping were put forward. The results show that the film stress value of TiO2 prepared by ion-beam assisted deposition is 40 MPa lower than that prepared by conventional process, and the stress of TiO2 film changes gradually from tensile stress into compressive stress with increasing ion energy;while the film stress of SiO2 is a tensile stress under ion-beam assisted deposition because of the ion-beam sputtering effect, and the film refractive index decreases with increasing ion energy. A dynamic film stress control can be achieved through in-situ adjustment of the processing parameters based on the online film stress measuring technique, and the intrinsic stress of film can be effectively changed through film doping. |
| Keyword | Film Stress Stress Controlling Ion-beam Assisted Deposition Hartmann-shack Sensor Thin-films Residual-stress |
| Subject Area | 制造工艺力学 |
| DOI | 10.1007/s10409-012-0146-z |
| URL | 查看原文 |
| Indexed By | SCI ; EI ; CSCD |
| Language | 英语 |
| WOS ID | WOS:000310884300018 |
| WOS Keyword | THIN-FILMS; RESIDUAL-STRESS |
| WOS Subject | Engineering, Mechanical; Mechanics |
| Department | NML纳米生物光学 |
| Classification | 二类 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://dspace.imech.ac.cn/handle/311007/46583 |
| Collection | 微重力重点实验室 |
| Corresponding Author | Jin, G |
| Recommended Citation GB/T 7714 | Li YQ,Wang HQ,Wang WY,et al. Effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 and stress control[J]. ACTA MECHANICA SINICA,2012,28,5,:1382-1388. |
| APA | Li YQ.,Wang HQ.,Wang WY.,Yu ZN.,Liu HS.,...&Jin, G.(2012).Effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 and stress control.ACTA MECHANICA SINICA,28(5),1382-1388. |
| MLA | Li YQ,et al."Effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 and stress control".ACTA MECHANICA SINICA 28.5(2012):1382-1388. |
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| SCI-J2012-060.pdf（594KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | View Download | |
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