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Layer thickness dependent tensile deformation mechanisms in sub-10nm multilayer nanowires
Yuan FP(袁福平); Wu XL(武晓雷); Yuan, FP; Chinese Acad Sci, State Key Lab Nonlinear Mech, Inst Mech, Beijing 100190, Peoples R China.
Source PublicationJOURNAL OF APPLIED PHYSICS
2012-06-15
Volume111Issue:12Pages:124313
ISSN0021-8979
AbstractUsing molecular dynamics simulations, the tensile deformation behavior for two types of sub- 10 nm multilayer nanowires (NWs) have been investigated. For the structure with interfaces perpendicular to the wire axis, the deformation mechanism is changed from interface crossing by dislocations to interface rotation as the layer thickness is decreasing, causing a significant reduction in yield strength. However, the deformation mechanisms are all accommodated through interface crossing by dislocations regardless of layer thickness for the structure with interfaces parallel to the wire axis. Moreover, the yield strengths in the second structure are found to be controlled by two competing mechanisms: the interface strengthening by increased repulsive force and interface softening by increased dislocation source sites. The sudden stress drop after yielding point in NWs could be explained by the dislocation source- limited hardening mechanism: the more atomic fraction of newly formed stacking faults (SF) after stress drop, the larger normalized stress drop and the larger uniform tensile elongation. For the second structure, the larger total tensile elongation for larger layer thickness could be related to the twinning induced plasticity at the necking position. These findings should have implications for designing functionalized structures and devices in nanoelectromechanical systems.
KeywordGold Nanowires Metal Nanowires Atomistic Simulations Phase-transformation Molecular-dynamics Ultrahigh-strength Yield Strength Single-crystal Interfaces Stress
Subject Area损伤、破坏机理和微结构演化
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Indexed BySCI ; EI
Language英语
WOS IDWOS:000305832100122
Funding OrganizationThe authors would like to acknowledge the financial support of 973 Program of China (Nos. 2012CB932203 and 2012CB937500) and NSFC (Grant Nos. 11002151 and 11072243).
DepartmentLNM材料介观力学性能的表征
Classification二类/Q2
Citation statistics
Cited Times:21[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/46706
Collection非线性力学国家重点实验室
Corresponding AuthorYuan, FP; Chinese Acad Sci, State Key Lab Nonlinear Mech, Inst Mech, Beijing 100190, Peoples R China.
Recommended Citation
GB/T 7714
Yuan FP,Wu XL,Yuan, FP,et al. Layer thickness dependent tensile deformation mechanisms in sub-10nm multilayer nanowires[J]. JOURNAL OF APPLIED PHYSICS,2012,111,12,:124313.
APA 袁福平,武晓雷,Yuan, FP,&Chinese Acad Sci, State Key Lab Nonlinear Mech, Inst Mech, Beijing 100190, Peoples R China..(2012).Layer thickness dependent tensile deformation mechanisms in sub-10nm multilayer nanowires.JOURNAL OF APPLIED PHYSICS,111(12),124313.
MLA 袁福平,et al."Layer thickness dependent tensile deformation mechanisms in sub-10nm multilayer nanowires".JOURNAL OF APPLIED PHYSICS 111.12(2012):124313.
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