| Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy | |
Xu J; Li ZY(李正阳) ; Munroe P; Xie ZH; Xu, J (reprint author), Nanjing Univ Aeronaut & Astronaut, Dept Mat Sci & Engn, 29 Yudao St, Nanjing 210016, Jiangsu, Peoples R China.
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| Source Publication | RSC ADVANCES
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| 2014 | |
| Volume | 4Issue:99Pages:55696-55708 |
| ISSN | 2046-2069 |
| Abstract | To explore the influence of Al alloying on the oxidation resistance of MoSi2, four Mo(Si1-xAlx)(2) nanocrystalline films, with differing Al contents, were fabricated on Ti-6A1-4V substrates by a double-cathode glow discharge technique and their cyclic oxidation behavior was characterized at 500 degrees C in air. The oxidation kinetics of the four Mo((Si1-xAlx)(2) films was found to obey a subparabolic behavior with respect to the overall exposure, and their oxidation resistance was improved by Al additions. On the other hand, the electrochemical behavior of the oxide scales developed on the four Mo((Si1-xAlx)(2) nanocrystalline films in a 3.5 wt% NaCl solution was studied using electrochemical-impedance spectroscopy (EIS). The impedance data showed that with increasing oxidation time, the oxide scales transformed from a homogeneous and dense structure to a duplex structure consisting of a porous outer layer and a denser inner layer. The resistance of the oxide scales increased with increasing Al addition, implying an enhanced protective ability of the oxide scales by Al alloying in media containing chlorine ions. The findings represent a step forward in improving the surface integrity of alloy components used in the hot zones of jet engines. |
| Subject Area | Chemistry |
| URL | 查看原文 |
| Indexed By | SCI ; EI |
| Language | 英语 |
| WOS ID | WOS:000344997800004 |
| Funding Organization | The authors acknowledge the financial support of the National Natural Science Foundation of China under Grant no. 51175245 and no. 51374130 and the Aeronautics Science Foundation of China under Grant no. 2013ZE52058. |
| Department | MAMYAG激光毛化技术 |
| Classification | 二类/Q2 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://dspace.imech.ac.cn/handle/311007/49451 |
| Collection | 先进制造工艺力学实验室 |
| Corresponding Author | Xu, J (reprint author), Nanjing Univ Aeronaut & Astronaut, Dept Mat Sci & Engn, 29 Yudao St, Nanjing 210016, Jiangsu, Peoples R China. |
| Recommended Citation GB/T 7714 | Xu J,Li ZY,Munroe P,et al. Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy[J]. RSC ADVANCES,2014,4,99,:55696-55708. |
| APA | Xu J,李正阳,Munroe P,Xie ZH,&Xu, J .(2014).Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy.RSC ADVANCES,4(99),55696-55708. |
| MLA | Xu J,et al."Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy".RSC ADVANCES 4.99(2014):55696-55708. |
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