| Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings | |
Huang HJ(黄河激) ; Fu ZQ(付志强); Pan WX(潘文霞); Wu CK(吴承康)
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| Source Publication | Physics Procedia
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| 2012 | |
| Volume | 32Pages:598-604 |
| ISSN | 1875-3892 |
| Abstract | Fast plasma sintering deposition of SiC nano-structured coatings was achieved using a specially designed non-transferred dc plasma torch operated at reduced pressure. Employing the Taguchi method, the deposition parameters were optimized and verified. With the optimized combination of deposition parameters, homogeneous SiC coatings were deposited on relatively large area substrates of Φ50 mm and 50×50 mm with a deposition rate as high as 20 μm/min. Ablation test showed that such coatings can be used as oxidation resistance coatings in high temperature oxidizing environment. |
| Keyword | Reduced-pressure Plasma Sintering Deposition Silicon Carbide Coating Ultrafast Deposition |
| DOI | 10.1016/j.phpro.2012.03.606 |
| Indexed By | CPCI |
| Language | 英语 |
| WOS ID | WOS:000310677500086 |
| Department | LHD应用等离子体力学(CPCR) |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://dspace.imech.ac.cn/handle/311007/58192 |
| Collection | 高温气体动力学国家重点实验室 |
| Recommended Citation GB/T 7714 | Huang HJ,Fu ZQ,Pan WX,et al. Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings[J]. Physics Procedia,2012,32:598-604. |
| APA | Huang HJ,Fu ZQ,Pan WX,&Wu CK.(2012).Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings.Physics Procedia,32,598-604. |
| MLA | Huang HJ,et al."Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings".Physics Procedia 32(2012):598-604. |
| Files in This Item: | Download All | |||||
| File Name/Size | DocType | Version | Access | License | ||
| 389212010231-main.pd（577KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | View Download | |
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