Excellent impact resistance of multilayer metallic glass films subjected to micro-ballistic impact by overcoming dynamic size effects | |
Cheng YJ(程玉洁); 董金磊Dong, Jinlei; Shen, Yidi; Li, Fucheng; An, Qi; Jiang MQ(蒋敏强); Liu, Yanhui; Huang CG(黄晨光); Goddard, William A.; Wu XQ(吴先前) | |
Corresponding Author | Wu, Xianqian([email protected]) |
Source Publication | EXTREME MECHANICS LETTERS |
2023-09-01 | |
Volume | 63Pages:8 |
ISSN | 2352-4316 |
Abstract | Size effects are key issues that hinder the enhancement of impact resistance of films with increasing thickness. In this paper, we consider Ni2Ta amorphous metallic alloy as a prototype thin film and demonstrate that the impact resistance of metallic glass (MG) nanofilms with surface oxidation subjected to micro-ballistic impact can be increased significantly by lamination of thin monolayers, overcoming significantly the size effects in the impact resistance of MG nanofilms. Shear band formation and delamination are the dominant energy dissipation mechanisms for multilayered films under impact. Our molecular dynamics (MD) simulations confirmed that the interfaces between thin layers as modified by surface oxidation play an important role in the impact resistance of the multilayered films. Surface oxidation of multilayered films increases significantly the impact resistance due to oxidation-induced curly structure and the increase of the interfacial strength, which contributes greatly to the energy dissipation during impact. However, excessive oxidation initiates defects near the surfaces of the monolayers to therefore reduce greatly impact resistance of the multilayered films. Our work suggests an effective pathway for fabricating high-performance multilayered MG films with extraordinary impact resistance by overcoming the size effects through the lamination of monolayers. (c) 2023 Elsevier Ltd. All rights reserved. |
Keyword | Multilayered metallic glass Impact resistance Size effect Micro-ballistic impact Molecular dynamics simulation |
DOI | 10.1016/j.eml.2023.102067 |
Indexed By | SCI ; EI |
Language | 英语 |
WOS ID | WOS:001077151900001 |
WOS Keyword | TOTAL-ENERGY CALCULATIONS ; MOLECULAR-DYNAMICS ; SHEAR BANDS ; ARMOR |
WOS Research Area | Engineering ; Materials Science ; Mechanics |
WOS Subject | Engineering, Mechanical ; Materials Science, Multidisciplinary ; Mechanics |
Funding Project | National Key R&D Pro-gram of China[2021YFA0719200] ; National Natural Sci-ence Foundation of China[12272391] ; National Natural Sci-ence Foundation of China[12232020] ; Office of Naval Research, United States[N00014-22-S-B001] ; National Outstanding Youth Science Fund Project of National Natural Science Foundation of China[12125206] |
Funding Organization | National Key R&D Pro-gram of China ; National Natural Sci-ence Foundation of China ; Office of Naval Research, United States ; National Outstanding Youth Science Fund Project of National Natural Science Foundation of China |
Classification | 二类/Q1 |
Ranking | 1 |
Contributor | Wu, Xianqian |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://dspace.imech.ac.cn/handle/311007/93118 |
Collection | 非线性力学国家重点实验室 |
Recommended Citation GB/T 7714 | Cheng YJ,董金磊Dong, Jinlei,Shen, Yidi,et al. Excellent impact resistance of multilayer metallic glass films subjected to micro-ballistic impact by overcoming dynamic size effects[J]. EXTREME MECHANICS LETTERS,2023,63:8.Rp_Au:Wu, Xianqian |
APA | 程玉洁.,董金磊Dong, Jinlei.,Shen, Yidi.,Li, Fucheng.,An, Qi.,...&吴先前.(2023).Excellent impact resistance of multilayer metallic glass films subjected to micro-ballistic impact by overcoming dynamic size effects.EXTREME MECHANICS LETTERS,63,8. |
MLA | 程玉洁,et al."Excellent impact resistance of multilayer metallic glass films subjected to micro-ballistic impact by overcoming dynamic size effects".EXTREME MECHANICS LETTERS 63(2023):8. |
Files in This Item: | ||||||
File Name/Size | DocType | Version | Access | License | ||
Jp2023Fa090.pdf(2053KB) | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment