| Coexistence and Coevolution of Wrinkle and Ridge Patterns in the Film-Substrate System by Uniaxial Compression | |
| Yu, Senjiang3; Zhang, Jiahui1; Zhou, Hong2; Sun, Yadong2; Ni Y(倪勇)1,4 | |
| Corresponding Author | Yu, Senjiang([email protected]) ; Ni, Yong([email protected]) |
| Source Publication | LANGMUIR
 |
| 2023-12-28 | |
| Volume | 40Issue:1Pages:403-412 |
| ISSN | 0743-7463 |
| Abstract | Homogeneous wrinkles and localized patterns are ubiquitous in nature and are useful for a wide range of practical applications. Although various strain-driven surface instability modes have been extensively investigated in the past decades, understanding the coexistence, coevolution, and interaction of wrinkles and localized patterns is still a great challenge. Here, we report on the formation and evolution of coexisting wrinkle and ridge patterns in metal films deposited on poly-(dimethylsiloxane) (PDMS) substrates by uniaxial compression. It is found that the evolving surface patterns show unique features of morphological transition from stages I to III: namely, transition from localized ridges to coexisting wrinkles and ridges, and finally to sinusoidal-like structures, as the compression increases. Based on the compressive strain-driven surface instability theory and finite element numerical simulation, the morphological features, transition behaviors, and underlying mechanisms of such complex patterns are investigated in detail, and the changes of amplitude and wavelength versus the strain are consistent with our experiments. This work could promote a better understanding of the effect of strain localization and the interaction of multiple surface patterns in hard film-soft substrate systems. |
| DOI | 10.1021/acs.langmuir.3c02655 |
| Indexed By | SCI ; EI |
| Language | 英语 |
| WOS ID | WOS:001139486500001 |
| WOS Keyword | THIN-FILMS ; LOCALIZATIONS ; DEFORMATION ; TRANSITIONS ; MECHANICS |
| WOS Research Area | Chemistry ; Materials Science |
| WOS Subject | Chemistry, Multidisciplinary ; Chemistry, Physical ; Materials Science, Multidisciplinary |
| Funding Project | National Natural Science Foundation of China[12172113] ; National Natural Science Foundation of China[12025206] ; National Natural Science Foundation of China[LZ23A020003] ; Natural Science Foundation of Zhejiang Province[2022YFA1203602] ; National Key Research and Development Program of China |
| Funding Organization | National Natural Science Foundation of China ; National Natural Science Foundation of China ; Natural Science Foundation of Zhejiang Province ; National Key Research and Development Program of China |
| Classification | 二类 |
| Ranking | 1 |
| Contributor | Yu, Senjiang ; Ni, Yong |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://dspace.imech.ac.cn/handle/311007/94019 |
| Collection | 非线性力学国家重点实验室 |
| Affiliation | 1.Univ Sci & Technol China, Dept Modern Mech, CAS Key Lab Mech Behav & Design Mat, Hefei 230026, Peoples R China; 2.China Jiliang Univ, Dept Phys, Hangzhou 310018, Peoples R China; 3.Hangzhou Dianzi Univ, Coll Mat & Environm Engn, Key Lab Novel Mat Sensor Zhejiang Prov, Hangzhou 310018, Peoples R China; 4.Chinese Acad Sci, Inst Mech, State Key Lab Nonlinear Mech, Beijing 100190, Peoples R China |
| Recommended Citation GB/T 7714 | Yu, Senjiang,Zhang, Jiahui,Zhou, Hong,et al. Coexistence and Coevolution of Wrinkle and Ridge Patterns in the Film-Substrate System by Uniaxial Compression[J]. LANGMUIR,2023,40,1,:403-412.Rp_Au:Yu, Senjiang, Ni, Yong |
| APA | Yu, Senjiang,Zhang, Jiahui,Zhou, Hong,Sun, Yadong,&倪勇.(2023).Coexistence and Coevolution of Wrinkle and Ridge Patterns in the Film-Substrate System by Uniaxial Compression.LANGMUIR,40(1),403-412. |
| MLA | Yu, Senjiang,et al."Coexistence and Coevolution of Wrinkle and Ridge Patterns in the Film-Substrate System by Uniaxial Compression".LANGMUIR 40.1(2023):403-412. |
| Files in This Item: | Download All | |||||
| File Name/Size | DocType | Version | Access | License | ||
| Jp2023Fa285.pdf（13101KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | View Download | |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment