IMECH-IR  > 非线性力学国家重点实验室
Damage microstructures in Ti3SiC2 under successive Xe-He-H ions irradiation and annealing process
Chang, Qing; Peng Q(彭庆); Hao JN(郝剑楠); Qi, Pan; Lei, Penghui; Jiang, Ni; Ye, Chao
Source PublicationJOURNAL OF NUCLEAR MATERIALS
2024-10
Volume599Pages:155235
ISSN0022-3115
AbstractTi3SiC2 is recognized as a promising candidate material for nuclear energy applications; however, the micro- structural defects resulting from complex irradiation processes remain elusive. This study investigates the microstructural evolution of Ti3SiC2 under sequential Xe-He-H ions irradiation at room temperature, followed by annealing at 900 degrees C, employing both experimental and first-principles computational approaches. A reverse phase transformation occurred following He irradiation, indicating that He facilitates the remote migration and recombination of Si vacancies through the formation of He-Si pairs during annealing. Post-annealing, the Xeirradiated sample exhibited a widespread distribution of small Xe bubbles, whereas larger bubbles were prevalent at peak damage regions in the samples subjected to Xe+He and Xe+He+H irradiation. Concurrently, Si-rich precipitates with distinct distribution patterns were observed in samples irradiated with Xe, Xe+He, and Xe+He+H ions, significantly affecting the hardness. First-principles calculations reveal that the distinct damage profiles are primarily attributed to the dynamic behaviors of Si interstitials. The Ti-Si bonds are relatively weak and easily broken, leading to abundant Si interstitials in Xe ion irradiation, and He enhances Si diffusion. Conversely, H enhances Si segregation by preventing He from capturing Si interstitials. Within the TiC grains, He promotes Si migration, causing an approximately 700-fold increase in Si diffusivity at 900 degrees C. The Si segregation leads to the nucleation of (110) dislocation loops, culminating in the formation of distinctive strip-like Si clusters. This study elucidates the formation mechanism of Si segregation within Ti3SiC2, providing valuable insights for the design of irradiation-resistant materials.
KeywordTi3SiC2 Ion irradiation Bubble Si-rich precipitate Nano-hardness
DOI10.1016/j.jnucmat.2024.155235
Indexed BySCI ; EI
Language英语
WOS IDWOS:001346674500001
WOS Research AreaMaterials Science ; Nuclear Science & Technology
WOS SubjectMaterials Science, Multidisciplinary ; Nuclear Science & Technology
Funding OrganizationNational Key R&D Program of China {2022YFB3707200] ; National Natural Science Foundation of China {12272378] ; National Science Fund for Distinguished Young Scholars of China {12205236] ; High-level Innovation Research Institute Program of Guangdong Province {2020B0909010003] ; LiYing Program of the Institute of Mechanics, Chinese Academy of Sciences {E1Z1011001] ; Innovation Capability Support Program of Shaanxi {2023-CX-TD-45, 2023KJXX-009]
Classification一类
Ranking1
ContributorYe C
Citation statistics
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/97180
Collection非线性力学国家重点实验室
Affiliation1.【Chang, Qing & Jiang, Ni & Ye, Chao】 Northwestern Polytech Univ, Inst Clean Energy, Yangtze River Delta Res Inst, Taicang 215400, Peoples R China
2.【Chang, Qing & Jiang, Ni & Ye, Chao】 Northwestern Polytech Univ, Sci & Technol Thermo Struct Composite Mat Lab, Xian 710072, Shaanxi, Peoples R China
3.【Peng, Qing & Hao, Jiannan】 Chinese Acad Sci, Inst Mech, State Key Lab Nonlinear Mech, Beijing 100190, Peoples R China
4.【Peng, Qing】 Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
5.【Peng, Qing】 Guangdong Aerosp Res Acad, Guangzhou 511458, Peoples R China
6.【Qi, Pan】 China Nucl Power Operat Technol Corp CNPO Ltd, Wuhan 430223, Peoples R China
7.【Lei, Penghui】 Xi An Jiao Tong Univ, Sch Nucl Sci & Technol, Xian, Peoples R China
Recommended Citation
GB/T 7714
Chang, Qing,Peng Q,Hao JN,et al. Damage microstructures in Ti3SiC2 under successive Xe-He-H ions irradiation and annealing process[J]. JOURNAL OF NUCLEAR MATERIALS,2024,599:155235.Rp_Au:Ye C
APA Chang, Qing.,彭庆.,郝剑楠.,Qi, Pan.,Lei, Penghui.,...&Ye, Chao.(2024).Damage microstructures in Ti3SiC2 under successive Xe-He-H ions irradiation and annealing process.JOURNAL OF NUCLEAR MATERIALS,599,155235.
MLA Chang, Qing,et al."Damage microstructures in Ti3SiC2 under successive Xe-He-H ions irradiation and annealing process".JOURNAL OF NUCLEAR MATERIALS 599(2024):155235.
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