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中国科学院力学研究所机构知识库
Knowledge Management System of Institue of Mechanics, CAS
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李明军 [1]
谭援强 [1]
高太元 [1]
魏红波 [1]
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2009 [1]
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润滑与密封 [1]
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表面粗糙度对化学机械抛光工艺过程流动性能的影响
期刊论文
润滑与密封, 2009, 期号: 8, 页码: 33-38+52
Authors:
魏红波
;
谭援强
;
高太元
;
李明军
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Submit date：2010/05/03
化学机械抛光
润滑方程
粗糙表面
分形
