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中国科学院力学研究所机构知识库
Knowledge Management System of Institue of Mechanics, CAS
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材料热处理学报 [1]
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离子源预处理工艺对WC基底表面及Ta缓冲涂层的影响
期刊论文
材料热处理学报, 2015, 卷号: 36, 期号: 6, 页码: 164-168
Authors:
魏俊俊
;
朱小研
;
陈良贤
;
刘金龙
;
黑立富
;
李成明
;
张勇
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Submit date：2015/12/25
离子源预处理
结合力
表面粗糙度
表面最大峰谷值
