Knowledge Management System of Institue of Mechanics, CAS
| The induction plasma chemical reactor: Part I. Equilibrium model | |
| Zhao GY; Mostaghimi J; Boulos MI | |
| Source Publication | Plasma Chemistry and Plasma Processing
 |
| 1990 | |
| Volume | 10Issue:1Pages:133-150 |
| ISSN | 0272-4324 |
| Abstract | A mathematical model is presented for the numerical simulation of the flow, temperature, and concentration fields in an rf plasma chemical reactor. The simulation is performed assuming chemical equilibrium. The extent of validity of this assumption is discussed. The system considered is the reaction of SiCl4 and NH3 for the production of Si3N4. |
| Keyword | Induction Plasma - Modeling - Chemical Equilibrium - Silicon Nitride Synthesis |
| DOI | 10.1007/BF01460452 |
| Indexed By | SCI |
| Language | 英语 |
| WOS ID | WOS:A1990CT88500008 |
| WOS Research Area | Engineering ; Physics |
| WOS Subject | Engineering, Chemical ; Physics, Applied ; Physics, Fluids & Plasmas |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://dspace.imech.ac.cn/handle/311007/39594 |
| Collection | 力学所知识产出(1956-2008) |
| Recommended Citation GB/T 7714 | Zhao GY,Mostaghimi J,Boulos MI. The induction plasma chemical reactor: Part I. Equilibrium model[J]. Plasma Chemistry and Plasma Processing,1990,10,1,:133-150. |
| APA | Zhao GY,Mostaghimi J,&Boulos MI.(1990).The induction plasma chemical reactor: Part I. Equilibrium model.Plasma Chemistry and Plasma Processing,10(1),133-150. |
| MLA | Zhao GY,et al."The induction plasma chemical reactor: Part I. Equilibrium model".Plasma Chemistry and Plasma Processing 10.1(1990):133-150. |
| Files in This Item: | Download All | |||||
| File Name/Size | DocType | Version | Access | License | ||
| A313.pdf（570KB） | 开放获取 | -- | View Download | |||
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