NaClO_3晶体生长过程光学诊断与数值模拟

IMECH-IR > 力学所知识产出(1956-2008)

	NaClO_3晶体生长过程光学诊断与数值模拟
	王涛; 段俐
Source Publication	应用数学和力学
	2006-09-15
Volume	27 Issue:9 Pages:1029-1035
Abstract	运用光学干涉诊断方法实时观测NaClO3晶体生长过程,得到晶体生长过程中溶液浓度,晶体尺寸等物理参量.将这些参量与数值模拟得到的结果进行比对,研究重力条件下NaClO3晶体溶液生长过程中速度场、浓度场的分布与演化,尝试提出符合实际情况的晶体生长理论模型.对比两种方法得到的浓度边界层厚度,数值模拟得到了与实验数据相一致的结论.
Keyword	晶体生长干涉测量数值模拟浓度边界层
Language	中文
Document Type	期刊论文
Identifier	http://dspace.imech.ac.cn/handle/311007/40070
Collection	力学所知识产出(1956-2008)
Corresponding Author	王涛
Recommended Citation GB/T 7714	王涛,段俐. NaClO_3晶体生长过程光学诊断与数值模拟[J]. 应用数学和力学,2006,27,9,:1029-1035.
APA	王涛,&段俐.(2006).NaClO_3晶体生长过程光学诊断与数值模拟.应用数学和力学,27(9),1029-1035.
MLA	王涛,et al."NaClO_3晶体生长过程光学诊断与数值模拟".应用数学和力学 27.9(2006):1029-1035.

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