| Modeling of ammonothermal growth processes of GaN crystal in large-size pressure systems | |
Chen QS(陈启生) ; Jiang YN(姜燕妮); Yan JY(颜君毅); Li W(李炜); Prasad V; Chen, QS (reprint author), Chinese Acad Sci, Inst Mech, 15 Bei Si Huan Xi Rd, Beijing 100190, Peoples R China
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| Source Publication | Research on Chemical Intermediates
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| 2011 | |
| Volume | 37Issue:2-5Pages:467-477 |
| ISSN | 0922-6168 |
| Abstract | Gallium nitride (GaN) is a wide-bandgap semiconductor material with a wide array of applications in optoelectronics and electronics. Modeling of the fluid flow and thermal fields is discussed, and simulations of velocity and volumetric-flow-rate profiles in different pressure systems are shown. The nutrient is considered as a porous media bed, and the flow is simulated using the Darcy-Brinkman-Forchheimer model. The resulting governing equations are solved using the finite-volume method. We analyzed the heat and mass transfer behaviors in autoclaves with diameters of 2.22, 4.44, and 10 cm. The effects of baffle design on flow pattern, and heat and mass transfer in different autoclaves are analyzed. For the research-grade autoclave with diameter of 2.22 cm, the constraint for the GaN growth is found to be the growth kinetics and the total area of seed surfaces in the case of baffle opening of 10%. For large-size pressure systems, the concentration profiles change dramatically due to stronger convection at higher Grashof numbers. The volumetric flow rates of the solvent across the baffles are calculated. Since ammonothermal growth experiments are expensive and time consuming, modeling becomes an effective tool for research and optimization of ammonothermal growth processes. |
| Keyword | Gan Ammonothermal Growth Baffle Opening Fluid Flow Thermal Fields Gallium Nitride |
| Subject Area | Chemistry |
| DOI | 10.1007/s11164-011-0276-0 |
| URL | 查看原文 |
| Indexed By | SCI ; EI |
| Language | 英语 |
| WOS ID | WOS:000291159400039 |
| WOS Keyword | GALLIUM NITRIDE |
| WOS Research Area | Chemistry |
| WOS Subject | Chemistry, Multidisciplinary |
| Department | NML流动稳定性与复杂流动 |
| Classification | 二类/Q2 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://dspace.imech.ac.cn/handle/311007/45089 |
| Collection | 微重力重点实验室 |
| Corresponding Author | Chen, QS (reprint author), Chinese Acad Sci, Inst Mech, 15 Bei Si Huan Xi Rd, Beijing 100190, Peoples R China |
| Recommended Citation GB/T 7714 | Chen QS,Jiang YN,Yan JY,et al. Modeling of ammonothermal growth processes of GaN crystal in large-size pressure systems[J]. Research on Chemical Intermediates,2011,37,2-5,:467-477. |
| APA | 陈启生,姜燕妮,颜君毅,李炜,Prasad V,&Chen, QS .(2011).Modeling of ammonothermal growth processes of GaN crystal in large-size pressure systems.Research on Chemical Intermediates,37(2-5),467-477. |
| MLA | 陈启生,et al."Modeling of ammonothermal growth processes of GaN crystal in large-size pressure systems".Research on Chemical Intermediates 37.2-5(2011):467-477. |
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| SCI-J2011157.pdf（330KB） | 开放获取 | -- | View Application Full Text | |||
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