Formation of Deposition Patterns Induced by the Evaporation of the Restricted Liquid

doi:10.1021/acs.langmuir.0c01116

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	Formation of Deposition Patterns Induced by the Evaporation of the Restricted Liquid
	Wang FS(王富帅)1,2; Wu, MM 3,4; Man, XK 3,4; Yuan QZ(袁泉子)1,2
通讯作者	Yuan, Quanzi([email protected])
发表期刊	LANGMUIR
	2020-07-28
卷号	36 期号:29 页码:8520-8526
ISSN	0743-7463
摘要	Evaporation-induced self-assembly of colloids or suspensions has received increasing attention. Given its critical applications in many fields of science and industry, we report deposition patterns constructed by the evaporation of the restricted aqueous suspension with polystyrene particles at different substrate temperatures and geometric container dimensions. With the temperature increases, the deposition patterns transition from honeycomb to multiring to island, which is attributed to the competition between the particle deposition rate U-p and the contact line velocity U-CL, and the dimension of the geometric container has an effect on the characteristics of patterns. In this paper, the formation of an ordered multiring pattern is mainly focused on as a result of U-p keeping up with U-CL such that the entire contact line can be pinned, that is, the periodic stick-slip motion of the contact line and the particle sedimentation. Moreover, based on the Onsager principle, we develop a theoretical model to reveal the physical mechanisms behind the multiring phenomena. The position and spacing of rings are measured, which shows that the theoretical prediction agrees well with experiments. We also find that the ring spacing decays exponentially from center to edge experimentally and theoretically. This may not only help us to understand the formation of the deposition patterns but also assist future design and control in practical applications. Evaporation-induced self-assembly of colloids or suspensions has received increasing attention. Given its critical applications in many fields of science and industry, we report deposition patterns constructed by the evaporation of the restricted aqueous suspension with polystyrene particles at different substrate temperatures and geometric container dimensions. With the temperature increases, the deposition patterns transition from honeycomb to multiring to island, which is attributed to the competition between the particle deposition rate U-P and the contact line velocity U-CL, and the dimension of the geometric container has an effect on the characteristics of patterns. In this paper, the formation of an ordered multiring pattern is mainly focused on as a result of U-P keeping up with U-CL such that the entire contact line can be pinned, that is, the periodic stick-slip motion of the contact line and the particle sedimentation. Moreover, based on the Onsager principle, we develop a theoretical model to reveal the physical mechanisms behind the multiring phenomena. The position and spacing of rings are measured, which shows that the theoretical prediction agrees well with experiments. We also find that the ring spacing decays exponentially from center to edge experimentally and theoretically. This may not only help us to understand the formation of the deposition patterns but also assist future design and control in practical applications.
DOI	10.1021/acs.langmuir.0c01116
收录类别	SCI ; EI
语种	英语
WOS记录号	WOS:000557757700020
关键词[WOS]	CONTACT-LINE ; POLYMER-SOLUTIONS ; DROPLETS ; STAINS ; FILM
WOS研究方向	Chemistry ; Materials Science
WOS类目	Chemistry, Multidisciplinary ; Chemistry, Physical ; Materials Science, Multidisciplinary
资助项目	National Natural Science Foundation of China (NSFC)[11722223] ; National Natural Science Foundation of China (NSFC)[11672300] ; National Natural Science Foundation of China (NSFC)[21822302] ; Chinese Academy of Sciences Key Research Program of Frontier Sciences[QYZDJ-SSWJSC019] ; Strategic Priority Research Program of the Chinese Academy of Sciences[XDB22040401]
项目资助者	National Natural Science Foundation of China (NSFC) ; Chinese Academy of Sciences Key Research Program of Frontier Sciences ; Strategic Priority Research Program of the Chinese Academy of Sciences
论文分区	二类
力学所作者排名	1
RpAuthor	Yuan, Quanzi
引用统计	被引频次：18[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://dspace.imech.ac.cn/handle/311007/84863
专题	非线性力学国家重点实验室
作者单位	1.Chinese Acad Sci, Inst Mech, State Key Lab Nonlinear Mech, Beijing 100190, Peoples R China; 2.Univ Chinese Acad Sci, Sch Engn Sci, Beijing 100049, Peoples R China; 3.Beihang Univ, Ctr Soft Matter Phys & Its Applicat, Beijing 100191, Peoples R China; 4.Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
推荐引用方式 GB/T 7714	Wang FS,Wu, MM,Man, XK,et al. Formation of Deposition Patterns Induced by the Evaporation of the Restricted Liquid[J]. LANGMUIR,2020,36,29,:8520-8526.Rp_Au:Yuan, Quanzi
APA	王富帅,Wu, MM,Man, XK,&袁泉子.(2020).Formation of Deposition Patterns Induced by the Evaporation of the Restricted Liquid.LANGMUIR,36(29),8520-8526.
MLA	王富帅,et al."Formation of Deposition Patterns Induced by the Evaporation of the Restricted Liquid".LANGMUIR 36.29(2020):8520-8526.

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