Knowledge Management System of Institue of Mechanics, CAS
Effect of bias voltage on the erosion performance of TiAlSiN coatings on TC6 substrate by high power impulse magnetron sputtering | |
Li, Hua![]() | |
Corresponding Author | Li, Liuhe([email protected]) ; Han, Mingyue([email protected]) |
Source Publication | SURFACE & COATINGS TECHNOLOGY
![]() |
2024-02-15 | |
Volume | 477Pages:20 |
ISSN | 0257-8972 |
Abstract | TiAlSiN coatings were deposited on TC6 substrates by high power impulse magnetron sputtering at various bias voltages for the improvement of titanium alloy anti-sand erosion performance. The effect of bias voltage on the composition, microstructure and mechanical properties were investigated by X-ray photoelectron spectroscopy, X-ray diffractometer, transmission electron microscopy, scanning electron microscopy, Rockwell-C indentation, scratch testing and nano nanoindentation. The erosion performance was evaluated at the impingent angles of 30 degrees and 90 degrees respectively in a sand blasting tester. With the application and increase in bias voltage, the discharge current increases from -87 A to -210 A. The coatings exhibit face center cubic structure, mainly composed of the (Ti,Al)N nanocrystallites and Si3N4 matrix. The preferred orientation shifts from (200) to (220) in the range of 0--150 V, but goes back to (200) at -200 V. The surface nodular defects and deposition rate are gradually reduced, yet the sectional structure becomes much denser. The residual stress is compressive and continually grows, whereas the adhesion strength, hardness (H), Young's modulus (E) and H/E ratio gradually increase before decreasing, arriving at maximum values of -68 N, -37.53 GPa, -339.9 GPa and 0.11 respectively at -150 V. The erosion resistance of the TiAlSiN coatings is consistent with these mechanical changes at various bias voltages and is also optimal at -150 V, which is -14 times that of TC6 substrate. The failure mechanism comes from coating brittleness nature, fractured chips and microcracks, regardless sand erosion angles, yet the driving forces are different. |
Keyword | Erosion TiAlSiN Bias voltage HiPIMS Failure mechanism |
DOI | 10.1016/j.surfcoat.2023.130263 |
Indexed By | SCI ; EI |
Language | 英语 |
WOS ID | WOS:001142668600001 |
WOS Keyword | MECHANICAL-PROPERTIES ; TIN FILMS ; MULTILAYER COATINGS ; TITANIUM NITRIDE ; ION-BOMBARDMENT ; DEPOSITION ; AL ; MICROSTRUCTURE ; GROWTH ; ENHANCEMENT |
WOS Research Area | Materials Science ; Physics |
WOS Subject | Materials Science, Coatings & Films ; Physics, Applied |
Funding Project | National Natural Science of China[NSFC 12275014] ; National Natural Science of China[NSFC 12305278] ; National Science and Technology Major Project[2017 -VII -0012-0108] ; National Science and Technology Major Project[2017 -VII -0003-0096] ; Fundamental Research Funds for the Central Universities[YWF-23-Q-1019] ; China Postdoctoral Science Foundation[2023M730180] |
Funding Organization | National Natural Science of China ; National Science and Technology Major Project ; Fundamental Research Funds for the Central Universities ; China Postdoctoral Science Foundation |
Classification | 一类 |
Ranking | 3+ |
Contributor | Li, Liuhe ; Han, Mingyue |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://dspace.imech.ac.cn/handle/311007/94214 |
Collection | 宽域飞行工程科学与应用中心 |
Recommended Citation GB/T 7714 | Li, Hua,Li, Liuhe,Wang, Xiaoting,et al. Effect of bias voltage on the erosion performance of TiAlSiN coatings on TC6 substrate by high power impulse magnetron sputtering[J]. SURFACE & COATINGS TECHNOLOGY,2024,477:20.Rp_Au:Li, Liuhe, Han, Mingyue |
APA | Li, Hua.,Li, Liuhe.,Wang, Xiaoting.,李国栋.,Li, Duoduo.,...&Han, Mingyue.(2024).Effect of bias voltage on the erosion performance of TiAlSiN coatings on TC6 substrate by high power impulse magnetron sputtering.SURFACE & COATINGS TECHNOLOGY,477,20. |
MLA | Li, Hua,et al."Effect of bias voltage on the erosion performance of TiAlSiN coatings on TC6 substrate by high power impulse magnetron sputtering".SURFACE & COATINGS TECHNOLOGY 477(2024):20. |
Files in This Item: | There are no files associated with this item. |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment