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基于化学修饰的纳米孔对整合素构象检测的方法
专利
发明授权.基于化学修饰的纳米孔对整合素构象检测的方法, 授权公告号: CN114199971B, 申请日期: 2021-12-16, 授权公告日期: 2024-03-22
Inventors:
梁丽媛
;
张明焜
;
王德强
;
吕守芹
;
吴吉
;
谢婉谊
;
李宁
;
潘君
;
李荣洁
;
尹雅洁
;
翁婷
;
殷博华
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Submit date：2024/12/10
