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The induction plasma chemical reactor: Part II. Kinetic model 期刊论文
Plasma Chemistry and Plasma Processing, 1990, 卷号: 10, 期号: 1, 页码: 151-166
Authors:  Zhao GY;  Mostaghimi J;  Boulos MI
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Induction Plasma - Modeling - Chemical Kinetics - Dissociation Of Silicon Tetrachloride  
The induction plasma chemical reactor: Part I. Equilibrium model 期刊论文
Plasma Chemistry and Plasma Processing, 1990, 卷号: 10, 期号: 1, 页码: 133-150
Authors:  Zhao GY;  Mostaghimi J;  Boulos MI
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Induction Plasma - Modeling - Chemical Equilibrium - Silicon Nitride Synthesis  
Impact of cathode evaporation on a free-burning arc 期刊论文
Journal of Physics D-Applied Physics, 1989, 卷号: 22, 期号: 11, 页码: 1692-1696
Authors:  Etemadi K;  Zhao GY;  Mostaghimi J;  ETEMADI, K (reprint author), SUNY BUFFALO, 217A BONNER HALL, BUFFALO, NY 14260 USA.
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