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The induction plasma chemical reactor: Part II. Kinetic model 期刊论文
Plasma Chemistry and Plasma Processing, 1990, 卷号: 10, 期号: 1, 页码: 151-166
Authors:  Zhao GY;  Mostaghimi J;  Boulos MI
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Induction Plasma - Modeling - Chemical Kinetics - Dissociation Of Silicon Tetrachloride